High efficiency tin-based EUV sources
نویسنده
چکیده
We have previously proposed ithography applications. Here we report advances in measurement
منابع مشابه
Modeling of EUV Emission and Conversion Efficiency from Laser-Produced Tin Plasmas for Nanolithography
Extreme ultraviolet lithography (EUVL) is a leading candidate for use in next-generation high volume manufacturing of semiconductor chips that require feature sizes less than 32 nm. The essential requirement for enabling this technology is to have a reliable, clean and powerful EUV source which efficiently emits light at a wavelength of 13.5 nm. Laserproduced plasma EUV sources are strong candi...
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Laser produced plasma (LPP) sources for extreme ultraviolet (EUV) photons are currently based on using small liquid tin droplets as target that has many advantages including generation of stable continuous targets at high repetition rate, larger photons collection angle, and reduced contamination and damage to the optical mirror collection system from plasma debris and energetic particles. The ...
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